IHafnium tetrachloride | HfCl4 umgubo | CAS 13499-05-3 | ixabiso lomzi-mveliso

IHafnium tetrachloride | HfCl4 umgubo | CAS 13499-05-3 | ixabiso ifektri Featured Umfanekiso

Inkcazelo emfutshane:

I-Hafnium tetrachloride inezicelo ezibalulekileyo njenge-precursor ye-hafnium oxide, i-catalyst ye-organic synthesis, izicelo zenyukliya, kunye nokubekwa kwefilimu encinci, igxininisa ukuguquguquka kwayo kunye nokubaluleka kwiinkalo ezahlukeneyo zobuchwepheshe.

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Intshayelelo emfutshane

Igama leMveliso: Hafnium tetrachloride
Inombolo yeCAS: 13499-05-3
Ifomula yoMdibaniso: HfCl4
Ubunzima beMolekyuli: 320.3
Imbonakalo: Umgubo omhlophe

Inkcazo

Into	Inkcazo
Imbonakalo	Umgubo oMhlophe
HfCl4+ZrCl4	≥99.9%
Zr	≤200ppm
Fe	≤40ppm
Ti	≤20ppm
Si	≤40ppm
Mg	≤20ppm
Cr	≤20ppm
Ni	≤25ppm
U	≤5ppm
Al	≤60ppm

Isicelo

I-Hafnium Dioxide Precursor: I-Hafnium tetrachloride isetyenziswe ngokuyinhloko njenge-precursor ukuvelisa i-hafnium dioxide (HfO2), into eneempawu ezibalaseleyo ze-dielectric. I-HfO2 isetyenziswa ngokubanzi kwizicelo ze-dielectric ze-high-k ze-transistors kunye ne-capacitors kwishishini le-semiconductor. I-HfCl4 ibalulekile ekwenziweni kwezixhobo zombane eziphambili ngenxa yobuchule bayo bokwenza iifilimu ezibhityileyo zehafnium dioxide.
Organic synthesis catalyst: I-Hafnium tetrachloride ingasetyenziselwa njenge-catalyst ye-organic synthesis reactions, ngakumbi i-olefin polymerization. Iimpawu zayo ze-Lewis acid zinceda ukwenza iziphakathi ezisebenzayo, ngaloo ndlela ziphucula ukusebenza kakuhle kweekhemikhali. Esi sicelo sibalulekile kwimveliso yeepolymers kunye nezinye izinto eziphilayo kwishishini lemichiza.
Ukusetyenziswa kweNyukliya: Ngenxa yecandelo layo eliphezulu lokufunxa i-neutron, i-hafnium tetrachloride isetyenziswa kakhulu kwizicelo zenyukliya, ngakumbi kwiintonga zolawulo lwezixhobo zenyukliya. I-Hafnium inokufunxa ngokufanelekileyo i-neutron, ngoko iyimathiriyeli efanelekileyo yokulawula inkqubo ye-fission, enceda ekuphuculeni ukhuseleko kunye nokusebenza kakuhle kokuveliswa kwamandla enyukliya.
Ukubekwa kwefilimu eNcinci: I-Hafnium tetrachloride isetyenziselwa kwiinkqubo ze-chemical vapor deposition (CVD) ukwenza iifilimu ezincinci zezinto ezisekelwe kwi-hafnium. Ezi filimu ziyimfuneko kwizicelo ezahlukeneyo, kubandakanywa i-microelectronics, optics, kunye neengubo zokukhusela. Ukukwazi ukufaka iyunifomu, iifilimu ezikumgangatho ophezulu zenza i-HfCl4 ixabiseke kwiinkqubo zokwenziwa kwemveliso.